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Aqueous Solution of Tetraethylammonium Hydroxide TMAH 20% for Organic Synthesis and Etching
Manufacturer:
NIOPIK OJSC
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Description
For applications in organic synthesis, analytical chemistry, anisotropic etching of silicon and gallium arsenide, and is also the basis for the production of metal-free developer for photoresist films and photoresist mask removal.
Specifications
Hydrogen index, pH units
13
Carbon dioxide salt concentration (in terms of CO2)
Not more than 1.00 %
appearance
Transparent liquid without mechanical inclusions
Concentration of tetramethylammonium hydroxide
20 %
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