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Silicon Dioxide for Thin-Film Optics - Ideal for Optical Coatings and Applications
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Description
Silicon (IV) oxide for thin layer optics, TU 2611-037-48591565-2014 is white tablets in the form of cylinders with height from 4 to 30 mm and diameter from 8 to 300 mm or granules 1-10 mm. Reacts with acid HF, does not react with alkalis, insoluble in water. Density 1.8-2.2 g/cm3.
Transparency area 0.2-9 µm. Formula SiO2. Recommended evaporation temperature is 1800-2200 C.
Purpose and scope of application: as a starting material for manufacturing thin-layer optical coatings by thermal and electron-beam evaporation in vacuum. Product packing is carried out according to GOST 3885. Packing group III, IV, V.
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