Vacuum Coating System with Magnetron Sputtering for Efficient Layer Application

Group processing of substrates: Ø76mm, Ø100mm, Ø150mm;
Two sluice chambers for loading - unloading of substrates from cassette to cassette;
Conveyor system for continuous transport of wafers;
Pre-heating of wafers by lamp heater and their cleaning by ion source;
Oil-free pumping system;
Consumption power not more than 25 kW.